Expert Metrology Course

The Expert Metrology Course is a two-day training event dedicated to advanced characterization and metrology measurement methods for semiconductor materials, structures and devices. Organized by the Center for Surface Science and Nanotechnology (CSSNT) and hosted by the National University of Science and Technology POLITEHNICA Bucharest, the course brings together experts in semiconductor characterization to share their knowledge and practical experience with researchers, academics and PhD students.

Why attend? Participants will gain insight into the operating principles, capabilities and limitations of a range of advanced metrology techniques widely used in semiconductor research and development. The course will also explore measurement strategies, data interpretation methods and common sources of uncertainty, while demonstrating how complementary characterization approaches can be combined to address complex materials and device-related challenges.

The course will cover the following advanced characterization techniques, with an with emphasis on their applications in semiconductor research and development: SEM-FIB, STEM-EDX-EELS, AFM, AFM-IR, SHG, PL, Raman

On day 1, lecturers will focus on sample preparation using SEM-FIB and atomic and nanoscale imaging using STEM-EELS. On day 2, surface science topic such as AFM-IR, SHG and Raman will be covered. All theoretical notions will be also supported by laboratory visits planned for each module, giving participants the opportunity to discuss their research questions directly with specialists in the field.

Who should attend? This course is intended for PhD students, Academic researchers, Professors, R&D professionals working on advanced semiconductor technologies and related processes.