NanoIC pilot line welcomes ASML’s TWINSCAN NXT:2150i
Early November, we successfully moved ASML's TWINSCAN NXT:2150i – the most advanced deep ultraviolet (DUV) immersion lithography system available today – into imec's cleanroom.
With enhanced overlay accuracy, improved critical dimension uniformity, and optimized system dynamics, the NXT:2150i supports NanoIC’s mission to push the boundaries of semiconductor scaling.
What's more, with ASML’s full product portfolio being integrated into imec’s pilot line – including High-NA EUV – NanoIC can tap into the world's most advanced infrastructure for semiconductor R&D.
While High-NA EUV will be used for the most demanding layers, the NXT:2150i will handle many less critical layers.
Offering high throughput, the tool will accelerate imec’s capacity to develop and validate new process modules at industry-relevant dimensions, shortening learning cycles and speeding up the path from idea to prototype.
Watch the video for a behind-the-scenes look at this exciting step forward in the development of the NanoIC pilot line.
aCCCess has received funding from the European Union’s Digital Europe Chips JU under Grant Agreement No 101217840.
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